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URL: https://plasma.oxinst.com/products/icp-etching/plasmapro-100-polaris
Proper Citation: Oxford: PlasmaPro 100 Polaris Plasma Technology (RRID:SCR_020359)
Description: PlasmaPro 100 Polaris single wafer etch system offers solutions to produce etch results needed to maintain competitive edge, with experience of etching materials such as GaN, SiC and Sapphire.
Resource Type: instrument resource
Keywords: Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit,
Availability: Commercially available
Resource Name: Oxford: PlasmaPro 100 Polaris Plasma Technology
Resource ID: SCR_020359
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Source: SciCrunch Registry (RRID:SCR_005400)
Description: Interactive portal for finding and submitting biomedical resources. Resources within SciCrunch have assigned RRIDs which are used to cite resources in scientific manuscripts. SciCrunch Registry, formerly NIF Registry, provides resources catalog. Allows to add new resources. Allows edit existing resources after registration. Curators are tasked with identifying and registering resources, examining data, writing configuration files to index and display data and keeping contents current.
URL: https://rrid.site/rin/sources/SCR_005400
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