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URL: https://plasma.oxinst.com/products/rie/plasmapro-100
Proper Citation: Oxford: PlasmaPro 100 RIE Plasma Technology (RRID:SCR_020376)
Description: PlasmaPro 100 RIE modules deliver anisotropic dry etching. Being compatible with all wafer sizes up to 200mm, it has rapid change between wafer size, uniformity, high throughput and high precision processes, in situ chamber cleaning and end pointing, and wide temperature range electrode, from 150 degrees C to 400 degrees C.
Resource Type: instrument resource
Keywords: Oxford, Plasma Technology, Instrument, Resource equipment, Equipment, USEDit,
Availability: Commercially available
Resource Name: Oxford: PlasmaPro 100 RIE Plasma Technology
Resource ID: SCR_020376
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Source: SciCrunch Registry (RRID:SCR_005400)
Description: Interactive portal for finding and submitting biomedical resources. Resources within SciCrunch have assigned RRIDs which are used to cite resources in scientific manuscripts. SciCrunch Registry, formerly NIF Registry, provides resources catalog. Allows to add new resources. Allows edit existing resources after registration. Curators are tasked with identifying and registering resources, examining data, writing configuration files to index and display data and keeping contents current.
URL: https://rrid.site/rin/sources/SCR_005400
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